Sputtering Targets Supplier-Manufacturer-Thin Film Coating

Provide Sputtering Targets,Thin Film Coating,PVD,CVD Products,Materials

  • Home
  • About
  • Applications
  • Contact
  • Inquiry
  • Home
  • Uncategorized
Uncategorized

company news

Able Target Ltd in Tsinghua university, Beijing university of science and technology, Beijing university of aeronautics with many professors, senior engineers…

February 9, 2012 SputterTargetNo Comment on company news
Uncategorized

sputtering target supplier

AbleTarget Limited provides all kinds of sputtering targets,high purity and density targets,rotatable Targets,alloy targets,pure metal targets and other sputtering coating…

November 29, 2011 SputterTargetalloy targets, CVD coatings, pure metal targets, PVD coatings, rotatable targetsNo Comment on sputtering target supplier
Uncategorized

sputtering targets fabrication

 sputtering targets fabrication method: There are many kinds of manufacture methods of sputtering targets, but all is by materials’ performation.…

November 24, 2011 SputterTargetsputtering targets fabricationNo Comment on sputtering targets fabrication
Uncategorized

Semiconductor

Semiconductor Able Target Limited offer semiconductor material for all the world. Now Able Target Limited not only offer single element semiconductor…

November 2, 2011 SputterTargetthin film materialNo Comment on Semiconductor
Uncategorized

Silicides Ceramic Sputtering Targets

Silicides Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Able Target…

October 27, 2011 SputterTargetCoSi2, Cr3Si, CrSi2, HfSi2, MoSi2, NbSi2, Silicides Ceramic Sputtering Targets, Ta5Si3, TaSi2, Ti5Si3, TiSi2, V3Si, VSi2, WSi2, ZrSi2No Comment on Silicides Ceramic Sputtering Targets
Uncategorized

alloy sputtering targets

Able Target has a very high priority in the alloy sputtering targets.We can supply all kinds of alloy sputtering targets with very…

October 27, 2011 SputterTargetAgCu, AgSn, AlAg, AlCr, AlCu, alloy sputtering targets, AlMg, AlNd, AlSi, AlSiCu, AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CoCr, CoCrMo, CoFe, CoFeB, CoNbZr, CoNi, CoNiCr, CoNiPt, CoPt, CoTaZr, CoZr, CrB, CrCu, CrSi, CrV, CuCo, CuGa, CuIn, CuNi, CuZr, DyFe, DyFeCo, FeB, FeC, FeMn, GdFe, GdFeCo, HfFe, InSn, IrMn, IrRe, MoNb, MoSi, NdDyFeCo, NiAl, NiCr, NiCrSi, NiFe, NiMn, NiNbTi, NiTi, NiV, SmCo, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiAL, TiCr, TiNi, W/Ti, WCu, WRe, ZnAl, ZnMg, ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrYNo Comment on alloy sputtering targets
Uncategorized

AbleTarget some standard materials

Standard Materials (other materials available on inquiry) Material Name Composition [wt%] Purity Ag Silver 100% 3N7, 4N, 5N Al Aluminium…

October 26, 2011 SputterTargetinquiry, standard materialsNo Comment on AbleTarget some standard materials
Uncategorized

Sputtering Targets for Magnetic Data Storage

As a big scale – and experienced – supplier of sputtering targets for the magnetic data storage industry, we understand…

October 26, 2011 SputterTargetmagnetic data storageNo Comment on Sputtering Targets for Magnetic Data Storage
Uncategorized

processing method for sputtering targets

processing method for sputtering targets Able Target Limited have lots of fabrication methods, with the best ways to manufacture products base…

October 24, 2011 SputterTargetCold Isostatic Pressing, Hot Isostatic Pressing, Hot Pressing, processing method for sputtering targets, Vacuum MeltingNo Comment on processing method for sputtering targets
Uncategorized

Sputter target supplier

Sputter target supplier Able Target Limited is an experter in supplying sputtering targets. We can offers a full line of sputtering…

October 24, 2011 SputterTargetNo Comment on Sputter target supplier
Uncategorized

Abletarget

Able Target is a leading global supplier of refractory metals and technical ceramics, and serves growing industries such as the…

October 23, 2011 SputterTargetceramics supplier, refractory metals supplierNo Comment on Abletarget
Uncategorized

engineered coatings

From strategic sourcing to designing value-add material processing,Able Target Limited delivers integrated engineered materials that optimize the manufacturing application process and…

October 21, 2011 SputterTargetAl2O3, engineered coating, SiAl, TiOx, Y2O3No Comment on engineered coatings
Uncategorized

sputtering target development

sputtering target development Able Target Limited builds quality rotatable sputtering targets using a range of materials and methods of manufacturing,…

October 21, 2011 SputterTargetsputtering target developmentNo Comment on sputtering target development
Uncategorized

Sputtering Target Maintenance

Sputtering Target Maintenance Ramp Rates Power should be ramped up SLOWLY to avoid arcing. Typical ramp rates for oxides are…

October 21, 2011 SputterTargetnon-refractory metal targets, Sputtering Target MaintenanceNo Comment on Sputtering Target Maintenance
Uncategorized

evaporation material

Evaporation material Able Target Limited provides a wide variety of evaporation materials for the vacuum deposition industry. Our materials are…

October 21, 2011October 21, 2011 SputterTargetcrucible, evaporating, Evaporation materialNo Comment on evaporation material
Uncategorized

sputtering systems

sputtering systems Materials are available in purities ranging from 99.9% to 99.9999% and are available for all sputtering systems –…

October 21, 2011 SputterTargetsputtering systems, thin film deposition processNo Comment on sputtering systems
Uncategorized

sputtering target for magnetic data storage

As the world’s largest  and most experienced supplier of sputtering targets for the magnetic data storage industry, Able Target understand the complex…

October 21, 2011 SputterTargetmagnetic data storageNo Comment on sputtering target for magnetic data storage
Uncategorized

CVD

Chemical vapor deposition Chemical vapor deposition(CVD) refers to the formation of the thin film on the substrate involves chemical reaction. …

October 13, 2011 SputterTargetChemical vapor deposition, metal-organic chemical vapor depsoisition, plasma-enhanced chemical vapor depositionNo Comment on CVD
Uncategorized

Electron beam evaporation

Electron beam evaporation  Electron beam evaporation research applications include medical, metallurgical, telecommunication, microelectronics, optical coating, nanotechnology and semiconductor industries. Typical…

October 13, 2011 SputterTargetaluminum, Aluminum Oxide, Antimony, Barium, Bismuth, Boron, boron carbide, calcium, cerium, chromium, Chromium Oxide, cobalt, copper, dysprosium, Electron beam evaporation, erbium, Gadolinium, gold, gold-germanium, gold-tin, hafnium, Hafnium Oxide, indium, Indium Tin Oxide, iridium, iron, lead, lithium, lithium fluoride, magnesium, magnesium fluroide, Magnesium Oxide, manganese, molybdenum, neodymium, nickel, nickel iron, nickel-chromium, niobium, palladium, permalloy hymu 80 (Fe-Mn-Mo-Ni), platinum, rhenium, rhodium, ruthenium, samarium, scandium, selenium, silicon, Silicon Dioxide, Silicon Monoxide, silver, strontium, tantalum, tantalum oxide, tin, Tin Oxide, titanium, Titanium Dioxide, titanium monoxide, tungsten, Tungsten Oxide, vanadium, ytterbium, Yttrium, yttrium fluoride, zinc, Zinc Oxide, zinc sulfide, zirconium, Zirconium OxideNo Comment on Electron beam evaporation
Uncategorized

PVD

Deposition methods that do not need sputtering targets Physical vapor deposition Physical vapor deposition (PVD). PVD refers to the purely…

October 13, 2011 SputterTargetEvaporation deposition, Physical vapor depositionNo Comment on PVD
Uncategorized

PLD

Deposition methods that do not need sputtering targets Pulsed laser deposition Pulsed laser deposition (PLD) uses pulses of a high-power…

October 13, 2011 SputterTargetPulsed laser depositionNo Comment on PLD
Uncategorized

SPUTTERING DEPOSITION

SPUTTERING DEPOSITION Sputtering deposition uses a plasma, which is usually formed from a non-reactive gas, to bombard the target material…

October 13, 2011 SputterTargetSputtering depositionNo Comment on SPUTTERING DEPOSITION
Uncategorized

Zinc Fluoride Sputtering Target

Able Target Limited,ATL, is a leading sputtering target manufacturer to a variety of markets including: Semiconductor, Wireless, Photonics, Data Storage,…

October 12, 2011October 12, 2011 SputterTargetZinc FluorideNo Comment on Zinc Fluoride Sputtering Target
Uncategorized

Evaporation Materials

Evaporation Materials Evaporative deposition is often used when higher speeds or lower temperatures than can be achieved with sputter deposition…

October 11, 2011 SputterTargetceramic, evaporation materials, metalNo Comment on Evaporation Materials
Uncategorized

Backing Plates

Backing Plates Able Target Ltd can provide customers backing plate for target bonding service. Materials Oxygen-Free Copper – The most…

October 11, 2011 SputterTargetBacking Plates, Copper backing plates, Molybdenum plate, oxygen-free copper, target bonding serviceNo Comment on Backing Plates
Uncategorized

Target Bonding

Target Bonding Nearly all PVD cathodes are water cooled. Depending on the requirements of the particular system and material you…

October 9, 2011 SputterTargetbonding materials, PVD cathodes, Target BondingNo Comment on Target Bonding
Uncategorized

Rods & Plates

  Rods and Plates. Able Target Limited casts any of the rare earth metals and most other advanced material into…

October 9, 2011 SputterTargetrare earth plates, rare earth rodsNo Comment on Rods & Plates
Uncategorized

Magnetic Materials

Magnetic Materials High strength magnets can be used in numerous industries, including aerospace, automotive, auditory engineering,biomedical imaging. Sputtering targets and…

October 8, 2011October 8, 2011 SputterTargetMagnetic Materials, Nd-Fe-B, neodymium iron boron alloy, SmCo5No Comment on Magnetic Materials
Uncategorized

Able Target Ltd

  As the leading company of sputtering targets supplier in China,Able Target Ltd can prodivide a large range of sputtering…

September 28, 2011 SputterTargetable target, sputtering targets supplier1 Comment on Able Target Ltd
Uncategorized

silicon

Able Target Ltd provide all kinds of Silicon materials such as silicon powder,silicon plate,ingot,sheet,and granules etc. Materials specifications: CAS#: 7440-21-3,…

September 28, 2011September 28, 2011 SputterTargetsilicon, silicon carbide, Silicon NitrideNo Comment on silicon
Uncategorized

sputtering target news

  Sputtering targets are used to produce thin films of metals or compounds for many industries or daily applications. A…

September 28, 2011 SputterTargetsputtered, Sputtering Targets, thin film coatingNo Comment on sputtering target news
Uncategorized

Evaporation material

Able Target LTD can process a variety of pellets and granules for evaporating coating,such as Pure metal : Aluminum pellet,…

September 27, 2011 SputterTargetAg pellet, Aluminum pellet, Cerium oxide(CeO2), Chrome rod, Copper pellet, Cr pellet, Dysprosium oxide(Dy2O3), Erbium oxide(Er2O3), Europium oxide(Eu2O3), Gadolinium oxide(Gd2O3), Hf pellet, Holmium oxide(Ho2O3), Iridium pellet, Lanthanum oxide(La2O3), Lutetium oxide(Lu2O3), Mo pellet, Neodymium oxide(Nd2O3), Ni Cr pellet, Ni pellet, Praseodymium oxide(Pr6O11), Samarium oxide(Sm2O3), Scandium oxide(Sc2O3), Tantalum( Ta) pellet, Terbium oxide(Tb4O7), Thulium oxide(Tm2O3), Tungsten (W) boat, Tungsten (W) pellet, Tungsten Rods, Ytterbium oxide(Yb2O3), Yttrium oxide(Y2O3), Zirconium (Zr) pelletNo Comment on Evaporation material
Uncategorized

Crucibles

Except sputtering targets,Able Target ltd can also produce various crucibles with high purity and good quality The ordinary Crucibles including…

September 27, 2011 SputterTargetIridium (Ir) crucibles, Molybdenum(Mo) crucibles, Niobium (Nb) crucibles, Platinum crucibles, Silver(Ag)crucibles, SiO2 crucibles, Ta2O5 crucibles, Tantalum (Ta) crucibles, TiO2 crucibles, Tungsten(W)cruciblesNo Comment on Crucibles
Alloy Targets, Compound-Targets, Oxide Sputtering Targets, Pure Metal Targets, Rare Earth and Other Materials, Rotatable Targets, Sputtering Targets, Uncategorized

Hello world!

Welcome to WordPress. This is your first post. Edit or delete it, then start blogging!

September 22, 2011September 23, 2011 SputterTargetwordpress1 Comment on Hello world!

Products Categories

  • Alloy Targets
  • Compound-Targets
  • Oxide Sputtering Targets
  • Pure Metal Targets
  • Rare Earth and Other Materials
  • Rotatable Targets
  • Sputtering Targets
  • Sputtering Targets Applications
  • Thin Film Coatings
  • Uncategorized

Company Information

  • About
  • Applications
  • Contact
  • Inquiry
  • Site Map

Browse Tags

Al2O3 aluminum Aluminum Oxide Antimony boron carbide boron target CdTe cerium chromium chromium target dysprosium erbium evaporation materials Gadolinium hafnium Hafnium Oxide indium Indium Tin Oxide ITO ITO target Magnesium Oxide magnesium target manganese target molybdenum molybdenum target neodymium nickel nickel target niobium niobium target rhenium selenium target silicon silicon carbide Silicon Dioxide Silicon Monoxide Sputtering sputtering target Sputtering Targets tantalum thin film coating titanium titanium target tungsten carbide Yttrium

Archives

Blogroll

  • Sputtering Targets Supplier Sputtering Targets Manufacturer

Blogroll

  • Sputtering Targets Supplier

Recent Posts

  • Niobium Pentoxide
  • Chromium
  • Neodymium oxide
  • Samarium Oxide
  • Bismuth Telluride

Contact Us

Able Target Limited

sales@abletarget.com
inquiry@abletarget.com
+86 56196646
+86 67261028
No.64,Yondingmen OuterStr. Beijing.China 100075
www.abletarget.com

Copyright © All rights reserved.
Business Point by ProDesigns