Bismuth Telluride/Bi2Te3 sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle,…
Cadmium Selenide
Cadmium Selenide/CdSe sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle,…
Cadmium Sulfide
Cadmium Sulfide, CdS sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step…
Lead Telluride
Lead Telluride, PbTe sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step…
Molybdenum Selenide
Molybdenum Selenide,MoSe2 sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle,…
Molybdenum Sulfide
Molybdenum Sulfide/MoS2 sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle,…
Zinc Selenide
Zinc Selenide/ZnSe sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle,…
Zinc Telluride
Zinc Telluride/ZnTe sputtering target Purity: 99.9 – 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle,…
Lithium Niobate
Lithium Niobate,LiNbO3 sputtering target Able Target Limited have engineers who have over 30 years’ research and development experience in the sputtering targets production …
Lead Zirconate-Titanate
Lead Zirconate-Titanate,PZT sputtering target Able Target offers a broad range of purities to satisfy the diverse range of semiconductor to…
Lead Zirconate
Lead Zirconate,PbZrO3 sputtering target Able Target is a full-service Thin-Film Materials provider. We offer high quality products designed for the…
Lead Titanate
Lead Titanate,PbTiO3 sputtering target Able Target Limited is a perfect supplier for sputtering targets and thin film coating materials for…
Bismuth Titanate
Bismuth Titanate,Bi4Ti3O12 sputtering target ABLE TARGET Limited have best excellent engineers with experienced skills and a specialty Magnetron Sputtering Technology focused on…
Barium Titanate
BaTiO3 target –Barium Titanate Able Target Limitedhave best excellent engineers with experienced skills and a specialty Magnetron Sputtering Technology focused…
PbZrO3
PbZrO3 sputtering target—Able Target Limited Able Target Limited specializes in high purity metal target,Evaporation and Pre-Melted Material with the highest…
LaSrMnO3
Able Target Limited can give you various choice on vacuum coating,PVD,CVD materials Able Target Limited can provide LaSrMnO3 sputtering targets…
Tellurides Ceramic Sputtering Targets
Able Target Limited provide any kind of ceramic sputtering targets for thin film coating materials and PVD & CVD coatings.…
Sulfides Ceramic Sputtering Targets
Sulfides Ceramic Sputtering Targets: AgS, Ag2S, CuS, Cu2S, Sb2S3, As2S3, CdS, FeS, GaS, GeS, PbS, SnS, In2S3, MoS2, NbS1.75, TaS2,…
Selenides Ceramic Sputtering Targets
Selenides Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Able Target Limited can provide…
Nitrides Ceramic Sputtering Targets
Nitrides Ceramic Sputtering Targets :AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Able Target Limited can provide sputtering…
Fluoride Ceramic Sputtering Targets
Fluoride Ceramic Sputtering Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3,…
Carbide Ceramic Sputtering Targets
Carbide Ceramic Sputtering Targets : B4C,Cr3C2,HfC,Mo2C,NbC,SiC,TaC, TiC, WC, W2C, VC, ZrC Able Target Limited can provide sputtering targets on Optical…
Boride Ceramic Sputtering Targets
Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, NbB2, TaB, TaB2, TiB2, W2B, WB,…
sputtering target for LCD
sputtering target for LCD In recent years the size of sputtering equipment has increased along with the increasing sizes of…
ITO sputtering target
Indium oxide/Tin oxide (ITO): ITO targets achieve a density of 90 to 98%. Particle sizes range from approximately 30 to…
Boron Nitride
Product name : Boron Nitride sputtering target, Boron Nitride target, BN target, BN sputtering target Item : Boron Nitride sputtering…
Titanic Carbide
Product name : Titanium Carbide target, Titanic Carbide sputtering target, TiC target, TiC sputtering target Item : Titanium Carbide target,…
Boron
Boron(B) Able Target Ltd can produce many kinds of sputtering targets like Boron target,Boron Carbide,Boron Nitride. Purity : 99%~99.5% Shape:…
Hello world!
Welcome to WordPress. This is your first post. Edit or delete it, then start blogging!